低能离子与物质相互作用中电子能损微观机制的研究进展

Progress on microscopic mechanism of electronic energy loss in the interactions between low energy ions and matter

  • 摘要: 深入了解离子与物质的相互作用是研究材料抗辐照性能以及应用离子束技术的基础和关键.离子的能量沉积是导致材料辐照损伤的根本原因,所以研究离子碰撞过程中的能损机制显得尤为重要.本文从离子与物质相互作用机制的研究背景和应用价值出发,阐述了有关载能离子在材料中的电子阻止本领的微观机制,总结了基于第一性原理分子动力学研究低速离子在材料中电子阻止本领的相关模型.回顾了国内外关于低能离子与物质相互作用中电子阻止本领及电子能损微观机制的理论和实验研究进展及发展趋势,论述了近几年北京师范大学在有关电子能损微观机制方面所取得的研究成果.阐述了电荷转移、化学键状态以及内层电子激发等因素对电子能损影响的微观机制,研究了在极低速度下电子阻止本领的阈值行为,为离子束技术的应用和材料抗辐照性能的评估提供了理论依据.对未来的研究进行建议展望.

     

    Abstract: A thorough knowledge of the ion-matter interaction is the basis and key to studying the anti-radiation performance of materials and solving the specific application of ion beam technology. The energy deposition of ions is the fundamental cause of irradiation damage to materials, so it is particularly important to study the energy loss mechanism in the process of ion collision. This paper will introduce the background and application value of energetic ions in the material and summarize the model of slow ions in the material based on first principles. In addition, the research progress and development trend of electronic stopping power and microscopic mechanism of electronic energy loss in the interaction between low energy ions and matter at home and abroad are reviewed from theoretical and experimental aspects, and the research results of Beijing Normal University on electronic energy loss in recent years are reviewed. The microscopic mechanism of electronic energy loss affected by charge transfer, chemical bond state, inner electron excitation, and other factors is expounded. The threshold behavior of electron stopping ability at a very low speed is studied, which provides a theoretical basis for the application of ion beam technology and the evaluation of the anti-irradiation performance of materials. Finally, the preliminary work is summarized and the future research is reviewed.

     

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